Contact Information Email: Click to Mail Phone: (805) 893-7346 Fax: (805) 893-4731 Office Location: 3337 Engineering II Address: Mail Code 5080 Chemical Engineering Dept. University of California Santa Barbara, CA 93106-5080 USA

Web Pages Research Group Home Page

Course Pages ChE 10 Introduction to Chemical Engineering ChE 132A Analytical Methods in Chemical Engineering ChE 594 Special Topics - Spectroscopy of Materials

Education & Honors

BS: Chemical Engineering, Colorado School of Mines, 1994

MS: Chemical Engineering, Colorado School of Mines, 1995; M.S. Applied Physics, California Institute of Technology, 1998

PhD: Chemical Engineering, California Institute of Technology, 2003

Honors: Intel Fellow (2000-2003)
Constantin G. Economou Prize (1997)

Research

The goal of our research is to explore, understand, and exploit the unique physicochemical properties and dynamics of nanoscale systems found in material science, microelectronics, catalysis, and biology. Our approach focuses on the development and application of "hybrid" scanning probe microscopy (SPM) techniques for chemical, optical, electrical, and mechanical interrogation of single nanostructures and surfaces to learn how size, confinement, organization, and surface chemistry affect behavior. The majority of our work is "hands-on" experimental science involving a combination of SPM (scanning tunneling, atomic force, and near-field optical microscopy - STM, AFM, SNOM), laser spectroscopy, and nanofabrication (litho, etching/deposition, nanoparticle synthesis/organization, and surface functionalization).

Current areas of interest include:

• Nanoscale chemical imaging of surfaces using near-field vibrational spectroscopy.
• Developing novel schemes (instruments and methods) to identify, measure, and manipulate individual molecules, nano-objects, and micro-scale systems.
• Plasmonics; optical enhancement / coupling effects involving nanoparticles, thin films, and array structures; optical and SPM-based nanolithography.

Publications

"Statistics of electrical breakdown field in HfO2 and SiO2 from millimeter to nanometer length scales", C. Sire, S. Blonkowski, M.J. Gordon, and T. Baron, Appl. Phys. Lett., in press (2007).

"Evidence of simultaneous double-electron promotion in F+ collisions with surfaces", J. Mace, M.J. Gordon, and K.P. Giapis, Phys. Rev. Lett. 97, 257603 (2006).

"Si nanowire growth and characterization using a microelectronics-compatible catalyst: PtSi", T. Baron, M. Gordon, F. Dhalluin, C. Ternon, P. Ferret, and P. Gentile, Appl. Phys. Lett. 89, 233111 (2006).

"Separation of colloidal nanoparticles using capillary immersion forces", M.J. Gordon and D. Peyrade, Appl. Phys. Lett. 89, 053112 (2006).

"Neutralization of hyperthermal Ne+ on metal surfaces", A. Kutana, M.J. Gordon, and K.P. Giapis, Nucl. Inst. Meth. B 248, 16 (2006).

"Direct observation and localization of colloidal nanoparticles on patterned surfaces by capillary forces", D. Peyrade, M. Gordon, G. Hyvert, K. Berton, and J. Tallal, Microelec. Eng. 83, 1521 (2006).

"AFM characterization of anti-sticking layers used in nanoimprint", J. Tallal, M. Gordon, K. Berton, and D. Peyrade, Microelec. Eng. 83, 851 (2006).

"Amplitude mode electrostatic force microscopy in UHV: quantification of nanocrystal charge storage", M.J. Gordon and T. Baron, Phys. Rev. B 72, 165420 (2005).

"4 Inch lift-off by trilayer nanoimprint lithography", J. Tallal, K. Berton, M. Gordon, and D. Peyrade, J. Vac. Sci. Tech. B 23, 2914 (2005).

"Replication of sub-40 nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithography", J. Tallal, D. Peyrade, F. Lazzarino, K. Berton, C. Perret, M. Gordon, C. Gourgon, and P. Schiavone, Microelec. Eng. 78-79, 676 (2005).

"Charge exchange mechanisms at the threshold of inelasticity in Ne+ collisions with surfaces", M.J. Gordon, J. Mace, and K.P. Giapis, Phys. Rev. A 72, 012904 (2005).

"A low-energy ion beamline scattering apparatus for surface science investigations", M.J. Gordon and K.P. Giapis, Rev. Sci. Inst. 76, 083302 (2005).

"Gas surface dynamics and profile evolution during etching of silicon", G.S. Hwang, C.M. Anderson, M.J. Gordon, T.A. Moore, T.K. Minton, and K.P. Giapis, Phys. Rev. Lett. 77, 3049 (1996).

"Low-temperature incineration of mixed wastes using bulk metal-oxide catalysts", M.J. Gordon, S. Gaur, S. Kelkar, and R.M. Baldwin, Catalysis Today 28, 305 (1996).