Alternative Patterning Strategies:
Imprint Lithography and Electric Field Assisted Assembly

Michael Dickey
University of Texas at Austin

Date: Tuesday, March 7, 2006
Time: 4:00 p.m.
Place: Engineering II, Room 3361

ABSTRACT

Photolithography is the cornerstone technology that has enabled the exponential growth in the microelectronics industry over the last half century. As photolithography approaches physical and economic barriers, interest in alternative patterning techniques has increased. Step and flash imprint lithography (SFIL) and electric field assisted assembly are alternative patterning techniques that are being investigated in our laboratory. SFIL is a high-resolution, yet low cost nano-imprinting technique that utilizes a transparent, quartz template with a relief structure to print very small patterns using a UV curable liquid monomer. The infrastructure for the SFIL process can be exploited to perform electric field assisted assembly, a process in which pillar arrays are formed by the amplification of electrohydrodynamic instabilities. This directed-assembly based patterning technique is appealing due to its simplicity and its ability to spontaneously form arrays of small structures. The development of the processes and materials used for these two patterning techniques will be discussed.