Scalable Nanopatterning to Engineer Light-Matter Interactions and Strain in III-Nitride Light Emitting Materials (*Zoom Presentation)


Wednesday, March 18, 2020 - 10:00am


Zoom Video Conference* (no in-person presentation)


Lesley Chan

*There will be no in-person public defense. For those who would like to attend remotely, please use the Zoom Video Conferencing link below:

Zoom Video Conferencing Link:

Advisor: Michael Gordon 


This talk will focus on the development and application of a tunable, scalable, and robust patterning methodology, based on colloidal lithography and plasma etching, to create graded-index, moth eye (ME)-like surface nanostructures to control reflection at IR and III-nitride material interfaces and realize novel, nanoscale light emitters. Colloidal mask particles were deposited on various substrates using Langmuir-Blodgett dip coating, followed by mask reduction, and mask pattern transfer into the underlying substrate using a combination of plasma and/or wet-chemical etching techniques. The resulting ME patterned surfaces and nanostructures were characterized and simulated using various experimental (SEM, AFM, photo/cathode/electro-luminescence, FTIR) and theoretical methods (finite difference time domain (FDTD) and Monte Carlo-based ray tracing), respectively, as well as incorporated into simple photonic and luminescent devices. Applications to be highlighted include broadband anti-reflective structures for IR optics, enhancing light extraction from nitride LEDs, strain relaxation of InGaN light emitters, and realization of solution-processable nanoLEDs.


Event Type: 

General Event